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STRUCTURE, MAGNETISM AND MAGNETORESISTANCE OF ANNEALED Co/Cu DISCONTINUOUS MULTILAYERS

S.S. Yan , J.X. Lou , L. Zhang , R.Z. Zhang , Y.M. Zhang , Y.H. Liu , L.M. Mei and J. Huang(Department of Physics , Shandong University , Jinan 250100 , China)(Department of Environment Engineering , Shandong University , Jinan 250100 , China)

金属学报(英文版)

Co/Cu discontinuons multilayers were prepared by rf-sputtering method under high sputtering power and then annealed at various temperutures in a high vacuum. The structural, magnetic and transport properties were strongly influenced by the annealing temperature. The annealed samples obviously became discontinuous multilayers.A maximum magnetoresistance ratio of 5.6% was obtained under a relatively low saturation field of about 400 (103/4π)A/m at the optimum annealing temperature of 450℃. When the annealing temperature was increased, the resistivity decreased, and the coercive force and the saturation field increased. The magnetoresistance ratio also depended on the thickness of Co and Cu layers. The magnetic and transport properties were explained on the basis of the discontinuous multilayered structure.

关键词: discontinuous multilayers , null , null

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